Manufacturing already went curvilinear — OPC, inverse lithography, and multi-beam mask writers print curves in production. Design never followed. Curvion brings curvilinear geometry up into physical design and carries it through to mask, so what you draw is what the wafer prints — without a correction pass to bridge the gap.
For forty years, design and manufacturing have spoken different languages—one in corners, one in curves. Curvion makes them speak the same one.
Physical design is still locked to Manhattan geometry and conservative, rule-based margins. The silicon that comes out of the fab is curvilinear. Today's flow papers over that mismatch with heavy post-design correction — OPC and mask steps bolted on after design — which adds cost, tape-out risk, and rigidity. Curvion removes the mismatch at the source.
A software PDK that generates curvilinear physical-design layout and takes it turn-key through post-design processing — complementary to the EDA flow you already run. It's built on a patent-pending path-based representation, with a working product GUI already in operation.
The mask side already went curvilinear: inverse lithography is commercialized and in production, and multi-beam mask writers removed the data-volume barrier that once made curves impractical to manufacture. The one place curvilinear still hasn't reached is design — and that's the opening Curvion is built for.
The same approach extends beyond logic into photonics, AR/VR optics, and CMOS image sensors — and it's designed to work alongside the incumbent EDA flow, not against it.
Real output from the platform — from a single standard cell to a full routed block, and across logic, photonics, and advanced-node design.
We're working with foundries, EDA vendors, design houses, and research groups to bring curvilinear design into production flows. If you're building at the edge of what lithography can print, let's talk.