§ TECH PATH-BASED · PROCESS-AWARE

Designing in curves, end to end.

Curva represents layout as parametric paths, not fixed rectangles. It generates curvilinear geometry against the target process from the start — then proves the mask and wafer can print it, and carries the result on toward post-design prep.

§ 01 — First principle

Manhattan geometry is a habit inherited from early tools, not a property of silicon. Manufacturing already prints curves — inverse lithography and multi-beam mask writers made that routine. The gap left to close is in design itself.

§ 02 — The engine

Six capabilities, one continuous flow.

Path-based representation

Layout is described as parametric path-and-width geometry — a curve captured by a few control points rather than thousands of stitched vertices. It is the foundation everything else is built on.

Represent

Automated curvilinear generation

Curved routing and cell geometry are generated automatically from that representation, finding paths that use the space efficiently while honoring connectivity.

Generate

Massive data reduction

Parametric curves compress the layout data that rectilinear approximation inflates — smaller files, lighter downstream processing, no exploding vertex counts.

Data

Process-aware by construction

Layout rules, spacing, and width targets for the specific process are folded into generation, so geometry is manufacturable as drawn instead of corrected afterward.

Process

OPC- and ILT-aligned

Geometry is shaped to how OPC and inverse lithography resolve patterns on mask and wafer, converging design intent with the printed image.

OPC · ILT

Turn-key post-design prep

The design carries through post-design data preparation toward mask, closing the loop from layout to a manufacturable, tape-out-ready result.

Mask

§ 03 — Scale

From one net to the full die.

The same representation and machinery apply whether the target is a single cell, a dense block, or — on the roadmap — a full chip. Area, connectivity, and manufacturability are handled together, not in separate passes.

That continuity is the point: curves shouldn't be a special case bolted onto a Manhattan flow. They should be how the layout is drawn in the first place.

See the platform →

FIELD // ROUTED_BLOCKSIGMET

Go deeper

See how the platform runs it.

From path-based generation to manufacturability checks and post-design prep, Curva turns curvilinear design into a workflow your team can run.

Explore the platform →Talk to us